Capra provides traceability features. In essence, it allows the creation of trace links between arbitrary artefacts, as long as an adapter for these artefacts is available. This way, a trace link can be created between EMF model elements, source code files supported by the Eclipse Platform (e.g., Java, C, Python), or tasks from an issue tracking system supported by Eclipse Mylyn. External artefacts for which the Eclipse Platform does not offer built-in support can also be linked if a fitting adapter is provided.
Eclipse TEA is a tasking orchestration engine that can be run from within the Eclipse IDE or headlessly. It is immediately concerned with tasks related to building and managing plug-ins for the Eclipse Platform, but is general enough to support other types of tasks and builds.
The Launch Configuration Generator is a small extension to the Eclipse IDE that allows to define launch configurations in a different way. Let me first elaborate on why the existing mechanism is sometimes not sufficient (on the other hand it is well suited for a lot of use cases, so we don't want to replace it completely!)
The Open Standard Business Platform (OSBP) comprises a model-based software factory composed of extensible frameworks, tools and runtime environments for building, deploying and managing business applications across their lifecycles.
The Apogy open source project provides a set of frameworks, EMF models, and Graphical User Interface components that simplify the creation of the software required to operate a physical system.
Given our background on space missions, Apogy includes support to represent 3D topologies, interact with simple sensors, provides a plan editor that allows an operator to simulate or control a system, data displays to monitor system during operation as well as models of environment into which the systems are operated.
The APP4MC project provides a tool chain environment and de-facto standard to integrate tools for all major design steps in the multi- and many-core development phase. A basic set of tools will be available to demonstrate all the steps needed in the development process. Companies and R&D partners will benefit from the de-facto standard for tool chains and the support given by the features of the extended APP4MC tool chain platform. The platform can be easily adapted with commercial or in-house tools.
PMF focuses in fact on high level presentation modeling concepts on GUI by ignoring the displaying technology artifacts such as appearence, layouts and data binding support. It allows each technology to make its specific connection with this framework.
The purpose of this framework is to provide the basic functional concepts of user interaction in a PIM level UI modeling language. The language can be extended in two ways:
